Refractive Variable Optical Attenuator Fabricated by Silicon Deep Reactive Ion Etching

IEEE Photonics Technology Letters

Volumn 16, Issue 2, 2004, Pages 485-487

  Kim, Young Yun ^a   Yun, Sung Sik ^b   Park, Chang Soo ^b   Lee, Jong Hyun ^b   Lee, Yeong Gyu ^c   Lee, Hyun Ki ^c   Yoon, Sang Ki ^c   Kang, Jun Seok ^c  

^a Korea Aerospace Research Institute (KARI)   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

^c Samsung Electro Mechanics   (South Korea)

Author keywords

Deep reactive ion etching (DRIE); Fiber optic components; Microelectroniechanical systems; Refractive optical wedge; Silicon optical leaker (SOL); Variable optical attenuator (VOA)

Indexed keywords

COMPUTER SIMULATION; DIFFRACTIVE OPTICS; ELECTRIC FIELD EFFECTS; FEEDBACK CONTROL; FIBER OPTIC COMPONENTS; INSERTION LOSSES; LIGHT POLARIZATION; LIGHT REFRACTION; LIGHT TRANSMISSION; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; REACTIVE ION ETCHING; REFRACTIVE INDEX; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; WAVELENGTH DIVISION MULTIPLEXING;

DEEP REACTIVE ION ETCHING (DRIE); REFRACTIVE OPTICAL WEDGE; SILICON OPTICAL LEAKER (SOL); VARIABLE OPTICAL ATTENUATOR (VOA);

ELECTRIC ATTENUATORS;

EID: 1442288489     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2003.818948     Document Type: Article

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