Deposition of vanadium(V) oxide thin films on nitrogen-containing self-assembled monolayers

Chemistry of Materials

Volumn 17, Issue 4, 2005, Pages 787-794

  Shyue, Jing Jong ^a   De Guire, Mark R ^a  

^a Case Western Reserve University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; FILM GROWTH; GROWTH KINETICS; NITROGEN; SALTS; SELF ASSEMBLY; SILICON; SOLUTIONS; VANADIUM COMPOUNDS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ALKYLAMMONIUM SALTS; FILM GROWTH RATES; SILICON SURFACES; VANADIUM (V) OXIDES;

THIN FILMS;

NITROGEN; VANADIUM PENTOXIDE;

AQUEOUS SOLUTION; ARTICLE; FILM; REACTION ANALYSIS; SYNTHESIS; THICKNESS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 13944276704     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm048501x     Document Type: Article

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