Structural investigations of chromium nitride films formed by ion beam-assisted deposition

Surface and Coatings Technology

Volumn 108-109, Issue , 1998, Pages 303-307

  Volz, K ^a   Kiuchi, M ^b   Ensinger, W ^c  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b OSAKA NATIONAL RESEARCH INSTITUTE   (Japan)

^c PHILIPPS UNIVERSITY MARBURG   (Germany)

Author keywords

Chromium nitride; Ion beam assisted deposition; Structure; TEM

Indexed keywords

CHROMIUM COMPOUNDS; DEPOSITION; ELECTRON IRRADIATION; EVAPORATION; ION BEAMS; ION IMPLANTATION; MOLECULAR STRUCTURE; MULTILAYERS; NITROGEN; PHASE DIAGRAMS; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

CHROMIUM NITRIDE; ION-BEAM ASSISTED DEPOSITION (IBAD);

CERAMIC COATINGS;

EID: 0040960555     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00565-9     Document Type: Article

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