Coordination number constraint models for hydrogenated amorphous Si deposited by catalytic chemical vapour deposition

Journal of Physics Condensed Matter

Volumn 17, Issue 5 SPEC. ISS., 2005, Pages

  Kawahara, Toshio ^a   Tabuchi, Norikazu ^b   Arai, Takashi ^c   Sato, Yoshikazu ^c   Morimoto, Jun ^c   Matsumura, Hideki ^b  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^c NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CATALYSIS; CHEMICAL BONDS; ELECTRON DIFFRACTION; FOURIER TRANSFORMS; HYDROGENATION; INFRARED SPECTROSCOPY; LIGHT ABSORPTION; LIQUID CRYSTAL DISPLAYS; MATHEMATICAL MODELS; OSCILLATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; TRANSISTORS;

INTERATOMIC POTENTIAL; OPTICAL ABSORPTION SPECTRA; REVERSE MONTE CARLO (RMC); SPIN DENSITY;

AMORPHOUS SILICON;

EID: 13744257005     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/17/5/011     Document Type: Conference Paper

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