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Volumn 24, Issue 12, 2004, Pages 1691-1696

Study of diffractive field based angular spectrum theory in thick film photoresist

Author keywords

Angular spectrum theory; Fast Fourier transform algorithm; Lithography; Optical transfer function; Physical optics; Thick film photoresist

Indexed keywords

FAST FOURIER TRANSFORMS; FREQUENCY DOMAIN ANALYSIS; NUMERICAL METHODS; OPTICAL TRANSFER FUNCTION; PHOTORESISTS; PHYSICAL OPTICS; REFRACTIVE INDEX;

EID: 13644282959     PISSN: 02532239     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (4)

References (12)
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    • Modifying the surface inhibition layer of thick resists for improved process control
    • Graham Arthur. Modifying the surface inhibition layer of thick resists for improved process control. Proc. SPIE, 2001, 4404: 372-379
    • (2001) Proc. SPIE , vol.4404 , pp. 372-379
    • Arthur, G.1
  • 3
    • 13644276242 scopus 로고    scopus 로고
    • Advanced simulation techniques for thick photoresist lithography
    • Flack W, Newman G, Bernrd D et al.. Advanced simulation techniques for thick photoresist lithography, Proc, SPIE, 1997, 3049: 789-804
    • (1997) Proc. SPIE , vol.3049 , pp. 789-804
    • Flack, W.1    Newman, G.2    Bernrd, D.3
  • 4
    • 0036990088 scopus 로고    scopus 로고
    • Study on new method of reducing standing wave effects in lithography
    • Chinese source
    • Xiao Xiao, Du Jinglei, Guo Yongkang et al.. Study on new method of reducing standing wave effects in lithography. Micro fabrication Technology, 2002, (4): 36-44 (in Chinese)
    • (2002) Micro fabrication Technology , Issue.4 , pp. 36-44
    • Xiao, X.1    Du, J.2    Guo, Y.3
  • 5
    • 0011257412 scopus 로고    scopus 로고
    • Lithography simulation employing rigorous solution to Maxwell's equations
    • Gordon R, Mack C A. Lithography simulation employing rigorous solution to Maxwell's equations. Proc. SPIE, 1998, 3334: 176-196
    • (1998) Proc. SPIE , vol.3334 , pp. 176-196
    • Gordon, R.1    Mack, C.A.2
  • 6
    • 0029403880 scopus 로고
    • Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications
    • Wong A K, Neureuther A R. Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications. IEEE, Transactions on Semiconductor Manufacturing, 1995, 8(4): 419-431
    • (1995) IEEE Transactions on Semiconductor Manufacturing , vol.8 , Issue.4 , pp. 419-431
    • Wong, A.K.1    Neureuther, A.R.2
  • 7
    • 13644275778 scopus 로고    scopus 로고
    • The kirchhoff transfer function and Rayleigh-Sommerfeld transfer function of diffraction
    • Chinese source
    • Li Junchang, Chen Jinbo, Fan Zebin et al.. The kirchhoff transfer function and Rayleigh-Sommerfeld transfer function of diffraction. J. Optoelectronics Laser, 2002, 13(1): 87-89 (in Chinese)
    • (2002) J. Optoelectronics Laser , vol.13 , Issue.1 , pp. 87-89
    • Li, J.1    Chen, J.2    Fan, Z.3
  • 11
    • 0013198162 scopus 로고    scopus 로고
    • Analysis of rigorous modal theory for arbitrary dielectric gratings made with anisotropic materials
    • Chinese source
    • Tang Xionggui, Fu Kexiang, Wang Zhiheng et al.. Analysis of rigorous modal theory for arbitrary dielectric gratings made with anisotropic materials. Acta Optica Sinica, 2002, 22(7): 774-779 (in Chinese)
    • (2002) Acta Optica Sinica , vol.22 , Issue.7 , pp. 774-779
    • Tang, X.1    Fu, K.2    Wang, Z.3
  • 12
    • 0043076039 scopus 로고    scopus 로고
    • Note on the S-matrix propagation algorithm
    • Li Lifeng. Note on the S-matrix propagation algorithm. J. Opt. Soc. Am. (A), 2003, 20(4): 655-660
    • (2003) J. Opt. Soc. Am. (A) , vol.20 , Issue.4 , pp. 655-660
    • Li, L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.