Modifying the surface inhibition layer of thick resists for improved process control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4404, Issue , 2001, Pages 372-379

  Arthur, G ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTROMECHANICAL DEVICES; PHOTOLITHOGRAPHY; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE TREATMENT;

SURFACE INHIBITION LAYERS;

PHOTORESISTS;

EID: 0034839896     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425229     Document Type: Conference Paper

References (5)

1. Thermal effects on the photoresist AZ1350J
2. Novolac resists used in positive resist systems
3. Development of positive photoresist
4. Modelling of solvent evaporation effects for hot plate baking of photoresists