Study on new method of reducing standing wave effects in lithography

Weixi Jiagong Jishu/Microfabrication Technology

Volumn , Issue 4, 2002, Pages 36-

  Xiao, Xiao ^a   Du, Jing Lei ^a   Guo, Yong Kang ^a   Yang, Jing ^a   Xie, Shi Wei ^a  

^a NONE

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EID: 0036990088     PISSN: 10038213     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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