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Volumn 49, Issue 4, 2005, Pages 670-672

AlGaN/GaN ohmic contact resistance variations across epitaxial suppliers

Author keywords

AlGaN GaN; GaN; Ohmic

Indexed keywords

GALLIUM NITRIDE; HIGH ELECTRON MOBILITY TRANSISTORS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR BEAM EPITAXY; OPTIMIZATION; SEMICONDUCTING ALUMINUM COMPOUNDS; SILICON CARBIDE;

EID: 13644264177     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2004.12.011     Document Type: Article
Times cited : (28)

References (5)
  • 5
    • 0036679147 scopus 로고    scopus 로고
    • Thermally-stable low-resistance Ti/Al/Mo/Au multilayer ohmic contacts on n-GaN
    • V. Kumar, L. Zhou, D. Selvanathan, and I. Adesida Thermally-stable low-resistance Ti/Al/Mo/Au multilayer ohmic contacts on n-GaN J Appl Phys 92 2002 1712 1715
    • (2002) J Appl Phys , vol.92 , pp. 1712-1715
    • Kumar, V.1    Zhou, L.2    Selvanathan, D.3    Adesida, I.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.