SCOPUS 정보 검색 플랫폼

Optical Materials

Volumn 27, Issue 5, 2005, Pages 900-903

Site of Er ions in Er-implanted silica containing Si nanoclusters

(8) Maurizio, C a D'Acapito, F a Priolo, F b Franzo G b Iacona, F c Borsella, E d Padovani, S e Mazzoldi, P e

a EUROPEAN SYNCHROTRON RADIATION FACILITY (France)

b UNIVERSITY OF CATANIA (Italy)

c CNR IMM (Italy)

d ENEA (Italy)

e UNIVERSITY OF PADOVA (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; BACKSCATTERING; CHEMICAL VAPOR DEPOSITION; CRYSTAL ATOMIC STRUCTURE; CRYSTALLOGRAPHY; DATA RECORDING; DOPING (ADDITIVES); FOURIER TRANSFORMS; ION IMPLANTATION; MONOCHROMATORS; SILICON;

CRYSTALLINE POWDERS; ER-IMPLANTED SILICA; NANOCLUSTERS; X-RAY ABSORPTION SPECTROSCOPY (EXAFS);

ERBIUM;

EID: 13544261517 PISSN: 09253467 EISSN: None Source Type: Journal
DOI: 10.1016/j.optmat.2004.08.032 Document Type: Conference Paper

Times cited : (12)

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