Porous silicon filters for mid-to-far IR range

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5524, Issue , 2004, Pages 158-168

  Christophersen, Marc ^a   Kochergin, Vladimir ^a   Swinehart, Philip R ^a  

^a Lake Shore Cryotronics Inc   (United States)

Author keywords

Electrochemical etching of multilayer structures; Mid to far IR filters; Porous Silicon

Indexed keywords

ELECTROCHEMICAL ETCHING OF MULTILAYER STRUCTURES; INFRARED FILTERS; IR ASTRONOMY; MID-TO-FAR IR FILTERS;

BANDPASS FILTERS; CHEMICAL VAPOR DEPOSITION; ETCHING; MULTILAYERS; OPTICAL FILTERS; PHYSICAL VAPOR DEPOSITION; SIGNAL INTERFERENCE;

POROUS SILICON;

EID: 13444273315     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557391     Document Type: Conference Paper

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