Defect-related photoluminescence of silicon nanoparticles produced by pulsed ion-beam ablation in vacuum

Applied Surface Science

Volumn 242, Issue 3-4, 2005, Pages 256-260

  Zhu, X P ^a   Yukawa, Tomiyuki ^a   Hirai, Makoto ^a   Suzuki, Tsuneo ^a   Suematsu, Hisayuki ^a   Jiang, Weihua ^a   Yatsui, Kiyoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Ablation plasma; Photoluminescence; Pulsed ion beam evaporation; Si nanoparticle

Indexed keywords

CRYSTALLINE MATERIALS; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; HYDROFLUORIC ACID; ION BEAMS; LIGHT EMISSION; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; VACUUM; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ABLATION PLASMA; CRYSTALLINITY; PULSED ION-BEAM EVAPORATION (IBE); SI NANOPARTICLES;

SILICON;

EID: 13444261123     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.08.019     Document Type: Article

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