Investigation of surface molecular orientation of poly(dimethylsiloxane-co- diphenylsiloxane)-modified poly(amic acid) films using dynamic contact angle measurements, NEXAFS and XPS

Journal of Adhesion Science and Technology

Volumn 18, Issue 15-16, 2004, Pages 1815-1831

  Kang, Jin Ho ^a   Cho, Kilwon ^a   Kim, Jin Kon ^a   Park, Chan Eon ^a   Uhm, Sung Jin ^a   Khatua, Bhanu Bhusan ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Dynamic contact angle; Near edge X ray absorption fine structure spectroscopy (NEXAFS); Photoresist; Poly(amic acid); Poly(dimethylsiloxane co diphenylsiloxane); XPS

Indexed keywords

ADHESION; CONTACT ANGLE; ORGANIC POLYMERS; PHOTORESISTS; SPIN COATING; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS; MOLECULAR ORIENTATION; ROLLING RESISTANCE; WETTING; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY;

DYNAMIC CONTACT ANGLE; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY (NEXAFS); POLAR ENVIRONMENT;

PLASTIC FILMS; NITROGEN COMPOUNDS;

ADVANCING CONTACT ANGLE; DIMETHYLSILOXANE; DYNAMIC CONTACT ANGLE; NEAR EDGE X-RAY ABSORPTION FINE STRUCTURE SPECTROSCOPIES; ON DYNAMICS; PHENYL GROUP; POLAR ENVIRONMENTS; POLY(AMIC ACID); POLY(DIMETHYLSILOXANE-CO-DIPHENYLSILOXANE); SURFACE MIGRATION;

EID: 13444252636     PISSN: 01694243     EISSN: None     Source Type: Journal    
DOI: 10.1163/1568561042708421     Document Type: Article

References (41)

1. H. Satou, H. Suzuki and D. Makino, in: Polyimides, D. Wilson, H. Stenzenberger and P. M. Hergenrother (Eds), p. 242. Blackie & Sons, New York, NY (1993).
2. C. Feger and H. Franke, in: Polyimides: Fundamentals and Applications, M. K. Ghosh and K. L. Mittal (Eds), p. 759. Marcel Dekker, New York, NY (1996).
3. L. P. Buchwalter, J. Adhesion Sci. Technol. 4, 697 (1990).
4. D. Suryanarayana and K. L. Mittal, J. Appl. Polym. Sci. 30, 3107 (1985).
5. H. G. Linde, J. Polym. Sci. Polym. Phys. 26, 1149 (1988).
6. T. H. Yoon, C. A. Arnold-McKenna and J. E. McGrath, J. Adhesion 39, 15 (1992).
7. H. K. Yun, K. Cho, J. H. An, C. E. Park, S. M. Sim and J. M. Park, J. Adhesion Sci. Technol. 8, 1395 (1994).
8. K. W. Lee, G. F. Walker and A. Viehbeck, J. Adhesion Sci. Technol. 9, 1125 (1995).
9. G. C. Tesoro, G. P. Rajendran, C. E. Park and D. R. Uhlmann, J. Adhesion Sci. Technol. 1, 39 (1987).
10. J. H. Seo, J. H. Kang, K. Cho and C. E. Park, J. Adhesion Sci. Technol. 16, 1839 (2002).
11. J. H. Kang, K. Cho and C. E. Park, Polymer 42, 2513 (2001).
12. J. H. Kang, K. Cho and C. E. Park, J. Adhesion Sci. Technol. 15, 913 (2001).
13. C. K. Cho, J. H. Kang, Y. T. An, K. Cho, C. E. Park and W. Huh, J. Adhesion Sci. Technol. 14, 108 (2000).
14. S. Wu, Polymer Interface and Adhesion. Marcel Dekker, New York, NY (1982).
15. N. L. Jarvis, R. B. Fox and W. A. Zismn, Adv. Chem. Ser. 43, 317 (1964).
16. M. K. Bernett, Polym. Eng. Sci. 17, 450 (1977).
17. N. Sprang, D. Theirich and J. Engemann, Surf. Coating. Technol. 74, 689 (1995).
18. A. Lippitz, J. F. Friedrich, W. E. S. Unger, A. Schertel and Ch. Wöll, Polymer 37, 3151 (1996).
19. A. Lippitz, I. Koprinarov, J. F. Friedrich, W. E. S. Unger and Ch. Wöll, Polymer 37, 3157 (1996).
20. J. Stöhr, NEXAFS Spectroscopy; Springer Series in Surface Science 25. Springer, Berlin (1992).
21. R. A. Rosenberg, P. J. Love and V. Rehn, Phys. Rev. B 33, 4034 (1986).
22. I. Koprinarov, A. Lippitz, J. F. Friedrich, W. E. S. Unger and Ch. Wöll, Polymer 39, 3001 (1998).
23. D. G. J. Sutherland, J. A. Carlisle, P. Elliker, G. Fox, T. W. Hagler, I. Jimenez, F. J. Himpsel, D. K. Shuh, W. M. Tong, J. J. Jia, T. A. Callcott and D. L. Ederer, Appl. Phys. Lett. 68, 2046 (1996).
24. T. Sakai, K. Ishikawa, H. Takezoe, N. Matsuie, Y. Yamamoto, H. Ishii, Y. Ouchi, H. Oji and K. Seki, J. Phys. Chem. B 105, 9191 (2001).
25. C. M. Chan, Polymer Surface Modification and Characterization. Hanser, Munich (1994).
26. C. Jama, J. D. Quensierre, L. Gengembre, V. Mineau, J. Grimblot and O. Dessaux, Surf. Interf. Anal. 27, 653 (1999).
27. C. M. Chan, T. M. Ko and H. Hiraoka, Surface Sci. Rep. 24, 1 (1996).
28. Q. T. Le, J. J. Pireaux and R. Caudano, J. Adhesion Sci. Technol. 11, 735 (1997).
29. W. J. Ort, J. H. van Zanten, W. Wu and S. K. Satija, Phys. Rev. Lett. 71, 867 (1993).
30. S. Wu, in: Polymer Blends, D. R. Paul and S. Newman (Eds), p. 244. Academic Press, New York, NY (1978).
31. H. Yasuda, T. Okuno and K. Yoshida, J. Polym. Sci. Polym. Phys. 26, 1781 (1998).
32. E. G. Rochow and H. G. Leclair, J. Inorg. Nucl. Chem. 1, 92 (1955).
33. M. G. Samart, J. Stöhr, H. R. Brown, T. P. Russell, J. M. Sands and S. K. Kumar, Macromolecules 29, 8334 (1996).
34. K. Weiss, C. Wöll, E. Böhm, B. Fiebranz, G. Forstmann, B. Peng, V. Scheumann and D. Johannsmann, Macromolecules 31, 1930 (1998).
35. J. Stöhr, M. G. Samart, A. Cossy-Favre, J. Diaz, Y. Momoi, S. Odahara and T. Nagata, Macromolecules 31, 1942 (1998).
36. K. Weiss, C. Wöll and D. Johannsmann, J. Chem. Phys. 113, 11297 (2000).
37. J. Zhao, S. R. Rojstaczer, J. Chen, M. Xu and J. A. Gardella, Macromolecules 32, 455 (1999).
38. K. Seki, H. Ishii, A. Yuyama, M. Watanabe, K. Fukui, E. Ishiguro, J. Yahazaki, S. Hasegawa, K. Horiuchi, T. Ohta, H. Isaka, M. Fujino, M. Fujiki, K. Furukawa and N. Matsumoto, J. Electron. Spectrosc. Relat. Phenom. 78, 403 (1996).
39. G. U. Stephen, C. T. Turci, T. Tyliszczak, M. A. Brook and A. P. Hitchcock, Organometallics 16, 2080 (1997).
40. V. R. McCrary, F. Sette, C. T. Chen, A. J. Lovinger, M. B. Robin, J. Stöhr and J. M. Zeigler, J. Chem. Phys. 88, 5925 (1988).
41. J. M. Zeigler and F. W. G. Fearon, Silicon-based Polymer Science: A Comprehensive Resource. American Chemical Society, Washington, DC (1990).