Characterization of ion beam and magnetron sputtered thin Ta/NiFe films

Journal of Applied Physics

Volumn 85, Issue 8 II B, 1999, Pages 5780-5782

  Mao, M ^a   Leng, Q ^a   Huai, Y ^a   Johnson, P ^a   Miller, M ^a   Tong, H C ^a   Miloslavsky, L ^a   Qian, C ^a   Wang, J ^b   Hegde, H ^b  

^a Readrite Corporation   (United States)

^b VEECO INSTRUMENTS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; MAGNETORESISTANCE; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ION BEAM DEPOSITION;

MAGNETIC THIN FILMS;

EID: 13044312740     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370124     Document Type: Article

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