Arrhenius Characterization of ILD and Copper CMP Processes

Journal of the Electrochemical Society

Volumn 151, Issue 2, 2004, Pages

  Sorooshian, J ^a   DeNardis, D ^a   Charns, L ^a   Li, Z ^a   Shadman, F ^a   Boning, D ^b   Hetherington, D ^c   Philipossian, A ^a  

^a UNIVERSITY OF ARIZONA   (United States)

^b Massachusetts Institute of Technology Cambridge   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COPPER; DIELECTRIC MATERIALS; PRESSURE EFFECTS; SLURRIES; VELOCITY MEASUREMENT;

ARRHENIUS CHARACTERIZATION; POLISHING PADS;

CHEMICAL MECHANICAL POLISHING;

EID: 1342283784     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1635388     Document Type: Article

References (17)

1. H. Kim, H. Kim, H. Jeong, E. Lee, and Y. Shin, J. Mater. Process. Technol., 130-131, 334 (2002).
2. J. Sorooshian, D. DeNardis, L. Charns, Z. Li, D. Boning, F. Shadman, and A. Philipossian, in Proceedings of CMP-MIC, VMIC, IEEE, p. 43, (2003).
3. T. Karaki, S. Miyake, and J. Watanabe, J. Soc. Precis. Eng., 12, 207 (1978).
4. H. Chiou, Z. Lin, L. Kuo, S. Shih, L. Chen, and C. Hsia, in Proceedings of the International Interconnect Technology Conference, IEEE, p. 83, (1999).
5. K. Wijekoon, S. Tsai, D. Bennett, M. Chandrachood, R. Abbassi, F. Redeker, and R. Tooles, Abstract 1221, The Electrochemical Society and The Electrochemical Society of Japan Meeting Abstracts, Vol. 99-158, Honolulu, HI, Oct 17-22, 1999.
6. K. Sasaki, Y. Nobuo, F. Kaneko, T. Hirabayashi, and K. Higuchi, U.S. Pat. 5, 770, 095 (1998).
7. D. White, J. Melvin, and D. Boning, J. Electrochem. Soc., 150, G271 (2003).
8. H. Hocheng, Y. Huang, and L. Chen, J. Electrochem. Soc., 146, 4236 (1999).
9. V. Bulsara, Y. Ahn, S. Chandrasekar, and T. Farris, J. Tribol., 119, 163 (1997).
10. F. W. Preston, J. Soc. Glass Technol., 11, 214 (1927).
11. P. Wrschka, J. Hernandez, Y. Hsu, T. S. Kuan, G. S. Oehrlein, H. J. Sun, D. A. Hansen, J. King, and M. A. Fury, J. Electrochem. Soc., 146, 2689 (1999).
12. D. C. Mejia and S. Beaudoin, J. Electrochem. Soc., 150, G96 (2003).
13. S. Olsen, Master's Thesis, University of Arizona, Tucson, AZ (2002).
14. A. Philipossian and E. Mitchell, Microcontamination, 20, 85 (2002).
15. L. M. Cook, J. Non-Ciyst. Solids, 120, 152 (1990).
16. W. Tseng and Y. Wang, J. Electrochem. Soc., 144, L15 (1997).
17. J. Lu, J. E. Garland, C. M. Petite, S. V. Babu, and D. Roy, Mater. Res. Soc. Symp. Proc., 767, F6.4.1 (2003).