Gas delivery and virtual process chamber concept for gas-assisted material processing in a focused ion beam system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3008-3011

  Ray, Valery ^a  

^a Particle Beam Systems and Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GAS DELIVERY; GAS INJECTION; GAS-ASSISTED MATERIAL PROCESSING; SECONDARY-ELECTRON TRAJECTORY SIMULATIONS;

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; ELECTRON EMISSION; ELECTRONS; ETCHING; GAS DYNAMICS; INTEGRATED CIRCUITS; NOZZLES; SIGNAL TO NOISE RATIO; TRAJECTORIES; VACUUM;

ION BEAMS;

EID: 13244298641     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1815306     Document Type: Conference Paper

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