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Volumn , Issue , 1999, Pages 255-261
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Modeling and Optimizing XeF 2-enhanced FIB Milling of Silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
FLIP CHIP TECHNOLOGIES;
FOCUSED ION BEAMS (FIB);
ASPECT RATIO;
CHEMICAL REACTIONS;
CURRENT DENSITY;
FAILURE ANALYSIS;
ION BEAMS;
OPTIMIZATION;
SPUTTERING;
XENON;
SILICON;
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EID: 1542360716
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (10)
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References (11)
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