Three-dimensional simulation of top down scanning electron microscopy images

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3399-3404

  Grella, Luca ^a   Lorusso, Gian ^a   Lee, Paul ^a   Frank, Fan ^a   Adler, David L ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE DEPOSITION; CHARGED SURFACES; ELECTRON RAYS; IMAGE RESOLUTION;

COMPUTER SIMULATION; ELECTRIC CHARGE; ELECTRIC FIELDS; ELECTRIC INSULATION; ELECTRIC POTENTIAL; ELECTRON BEAMS; KINETIC ENERGY; MONTE CARLO METHODS; OPTICAL RESOLVING POWER; PARTICLE BEAM TRACKING; THREE DIMENSIONAL;

SCANNING ELECTRON MICROSCOPY;

EID: 13244257268     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1825019     Document Type: Conference Paper

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