Simulations of Scanning Electron Microscopy Imaging and Charging of Insulating Structures

Scanning

Volumn 25, Issue 6, 2003, Pages 300-308

  Grella, Luca ^a   Lorusso, Gian ^a   Adler, David L ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Electron beam induced conductivity; Image simulation; Local fields; Monte Carlo simulation; Resist metrology; Secondary electron emission; Surface charging

Indexed keywords

ALGORITHMS; BACKSCATTERING; BOUNDARY CONDITIONS; CARRIER CONCENTRATION; COMPUTER SIMULATION; MONTE CARLO METHODS; RAY TRACING; SCANNING ELECTRON MICROSCOPY;

ELECTRON TRAJECTORY; SURFACE CHARGING;

IMAGING SYSTEMS;

ALGORITHM; ARTICLE; ELECTRON BEAM; ELECTRON MICROSCOPY; IMAGING SYSTEM; MONTE CARLO METHOD; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY;

EID: 0346150282     PISSN: 01610457     EISSN: None     Source Type: Journal    
DOI: 10.1002/sca.4950250606     Document Type: Article

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