Representation of nonrectangular features for exposure estimation and proximity effect correction in electron-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2929-2935

  Lee, S Y ^a   Hu, F ^a   Ji, J ^a  

^a AUBURN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CUMULATIVE DISTRIBUTION FUNCTIONS (CDF); PHOTONIC BAND GAPS (PBG); POINT SPREAD FUNCTIONS (PSF); PROXIMITY EFFECT CORRECTION;

APPROXIMATION THEORY; ARRAYS; COMPUTATIONAL METHODS; COMPUTER SIMULATION; DISTANCE MEASUREMENT; ELECTRON BEAMS; ERRORS; GEOMETRY; GRAPH THEORY; INTEGRATED CIRCUIT LAYOUT; INTEGRATION; MATHEMATICAL TRANSFORMATIONS; TWO DIMENSIONAL;

ELECTRON BEAM LITHOGRAPHY;

EID: 13244255818     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1824058     Document Type: Conference Paper

References (8)

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