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Volumn 208, Issue 1, 2000, Pages 409-415

Cross-sectional cleavages of SiC for evaluation of epitaxial layers

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; CRYSTAL LATTICES; EPITAXIAL GROWTH; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILICON CARBIDE; SURFACE STRUCTURE;

EID: 12944317522     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00484-4     Document Type: Article
Times cited : (20)

References (12)
  • 1
    • 0342889819 scopus 로고
    • Pergamon Press, London
    • R.W. Keyes, Silicon Carbide, Pergamon Press, London, 1960, p. 217.
    • (1960) Silicon Carbide , pp. 217
    • Keyes, R.W.1
  • 9
    • 85031584363 scopus 로고    scopus 로고
    • Extended defects in SiC epitaxial layers grown by sublimation
    • Charlottesville, Virginia, USA, 24-26 June
    • R. Yakimova, M. Syväjärvi, E. Janzén, Extended defects in SiC epitaxial layers grown by sublimation, 40th Electr. Mat. Conference, Charlottesville, Virginia, USA, 24-26 June, 1998, p. 35.
    • (1998) 40th Electr. Mat. Conference , pp. 35
    • Yakimova, R.1    Syväjärvi, M.2    Janzén, E.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.