|
Volumn 208, Issue 1, 2000, Pages 409-415
|
Cross-sectional cleavages of SiC for evaluation of epitaxial layers
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CRYSTAL DEFECTS;
CRYSTAL LATTICES;
EPITAXIAL GROWTH;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR GROWTH;
SILICON CARBIDE;
SURFACE STRUCTURE;
CROSS SECTIONAL CLEAVAGES;
SEMICONDUCTING FILMS;
|
EID: 12944317522
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(99)00484-4 Document Type: Article |
Times cited : (20)
|
References (12)
|