Preparation of TiO2 thin films at low temperature and characterization of their properties

Acta Physico - Chimica Sinica

Volumn 21, Issue 1, 2005, Pages 69-73

  Bao, Xing Wang ^a   Zhang, Jin Long ^a   Liang, Xue Hai ^a   Huang, Jia Zhen ^b   Zhang, Li Zhong ^b  

^a EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

AFM; Hot water treatment; Low temperature; Photocatalysis; TiO2 thin films

Indexed keywords

RHODAMINE B; SILICON DIOXIDE; TITANIUM DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL REACTION; CRYSTAL STRUCTURE; DEGRADATION KINETICS; LOW TEMPERATURE; PHOTOCATALYSIS; SURFACE PROPERTY; ULTRAVIOLET IRRADIATION; ULTRAVIOLET SPECTROSCOPY; WATER TREATMENT; X RAY DIFFRACTION;

EID: 12844272728     PISSN: 10006818     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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