Study of optical proximity effects using off-axis illumination with attenuated phase shift mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2440, Issue , 1995, Pages 222-239

  Ahn, Chang Nam ^a   Baik, Ki Ho ^a   Lee, Yong Suk ^a   Kim, Hung Eil ^a   Hur, Ik Boum ^a   Kim, Young Sik ^a   Kim, Ju Hwan ^a   Choi, Soo Han ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; OPTICS; PHASE SHIFT; PHOTORESISTS;

ATTENUATED PHASE SHIFT MASKS; DEPTH OF FOCUS; OFF AXIS ILLUMINATION; OPTICAL PROXIMITY EFFECTS; RESIST PATTERN PROFILES; SUPERRESOLUTION TECHNIQUE;

MASKS;

EID: 0029214803     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)