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Volumn 815, Issue , 2004, Pages 133-138

Thermoplastic deformation and residual stress topography of 4H-SiC wafers

Author keywords

[No Author keywords available]

Indexed keywords

DEFORMATION; EPITAXIAL GROWTH; RESIDUAL STRESSES; SEMICONDUCTOR MATERIALS; SILICON WAFERS; SINGLE CRYSTALS; STACKING FAULTS; THERMAL CONDUCTIVITY; THERMOPLASTICS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 12844263633     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-815-j6.2     Document Type: Conference Paper
Times cited : (6)

References (18)
  • 2
    • 0013277785 scopus 로고    scopus 로고
    • edited by W.-K. Chen (CRC Press and IEEE Press, Boca Raton, Florida)
    • P. G. Neudeck, in The VLSI Handbook, edited by W.-K. Chen (CRC Press and IEEE Press, Boca Raton, Florida, 2000), p. 6.1-6.24.
    • (2000) The VLSI Handbook
    • Neudeck, P.G.1
  • 5
    • 0034175339 scopus 로고    scopus 로고
    • Stacking fault energy of 6H-SiC and 4H-SiC single crystals
    • M. H. Hong, A. V. Samant, and P. Pirouz, "Stacking Fault Energy of 6H-SiC and 4H-SiC Single Crystals", Phil. Mag. A, 80(4), 919-935 (2000).
    • (2000) Phil. Mag. A , vol.80 , Issue.4 , pp. 919-935
    • Hong, M.H.1    Samant, A.V.2    Pirouz, P.3
  • 13
    • 12844285666 scopus 로고    scopus 로고
    • Cree, in 4600 Silicon Drive, 27703 ed. (Durham, NC)
    • Cree, in 4600 Silicon Drive, 27703 ed. (Durham, NC).
  • 14
    • 12844272201 scopus 로고    scopus 로고
    • Frontier Semiconductor, Inc, 1631 North First Street, San Jose, CA 95112 USA. (www.frontiersemi.com).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.