Strain modulation of transport criticality in RuO2-based thick-film resistors

Applied Physics Letters

Volumn 85, Issue 23, 2004, Pages 5619-5621

  Vionnet Menot, Sonia ^a   Grimaldi, Claudio ^a   Ryser, Peter ^a   Maeder, Thomas ^a,b   Strässler, Sigfrid ^a,b  

^a EPFL   (Switzerland)

^b Sensile Technologies SA   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CANTILEVER BEAMS; LOGARITHMIC AMPLIFIERS; METALLIC GLASS; PIEZOELECTRIC DEVICES; RUTHENIUM COMPOUNDS; STRAIN MEASUREMENT; THICK FILMS; TRANSPORT PROPERTIES;

ROBUST FORCE; STRAIN MODULATION; THICK-FILM RESISTORS (TFR); TRANSPORT CRITICALITY;

RESISTORS;

EID: 12844253856     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1835996     Document Type: Article

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