Suppression of Staebler-Wronski effect induced electrical crosstalk in a-Si:H-based image sensors

Materials Research Society Symposium Proceedings

Volumn 808, Issue , 2004, Pages 435-439

  Theil, Jeremy A ^a  

^a AGILENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CROSSTALK; HYDROGENATION; IMAGE SENSORS; INTEGRATION; LEAKAGE CURRENTS; PHOTODIODES;

CONTACT STRUCTURE; INTRINSIC LAYERS; PIXELS; STAEBLER-WRONSKI EFFECT (SWE);

AMORPHOUS SILICON;

EID: 12744266510     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-808-a10.6     Document Type: Conference Paper

References (9)

1. J. A. Theil, R. Snyder, D. Hula, K. Lindahl, H. Haddad, and J. Roland, J. Non-Cryst. Sol., 299, 1234 (2002).
2. J. A. Theil, M. Cao, G. Kooi, G. W. Ray, W. Greene, J. Lin, A. J. Budrys, U. Yoon, S. Ma, and H. Stork, MRS Symp. Proc., 609, A14.3.1 (2000).
3. H. Fischer, J. Schulte, P. Rieve, and M. Böhm, Mat. Res. Soc. Symp. Proc., 336, 867 (1994).
4. J. A. Theil, H. Haddad, R. Snyder, M. Zelman, D. Hula, and K. Lindahl, Proceedings of the SPIE, 4435, 206 (2001).
5. J. A. Theil, IEE Proc. Circuits, Devices, and Systems, 150(4), accepted for publication (2003).
6. J. A. Theil, MRS Symp. Proc., 762, 21.4 (2003).
7. M. Hack, J. G. Shaw, and M. Shur, J. Non-Cryst. Sol., 115, 150 (1989).
8. M. Shur, and M. Hack, J. Appl. Phys., 55(10) 3831 (1984).
9. M. Shur, C. Hyun, and M. Hack, J. Appl. Phys., 59(7) 2488 (1986).