C60-incorporated nanocomposite resist system

Journal of Photopolymer Science and Technology

Volumn 10, Issue 4, 1997, Pages 651-656

  Ishii, T ^a   Nozawa, H ^a   Tamamura, T ^a  

^a NTT CORPORATION   (Japan)

Author keywords

C60; Fullerene; Nanocomposite; Resist

Indexed keywords

EID: 12444345721     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.651     Document Type: Article

References (5)

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5. H. Ito, W. P. England, N. J. Clecak, G. Breyta, H. Lee, D. Y. Yoon, R. Sooriyakumaran, and W. D. Hinsberg, Proc. SPIE, 1259 (1993) 65.