NiB deposits on p-silicon using borohydride as a reducing agent

Materials Research Bulletin

Volumn 39, Issue 14-15, 2004, Pages 2187-2192

  Mondal, Anup ^a   Nath, Sabyashachi ^b   Mondal, Ashok ^b   Bandopadhyay, Sikha ^c   Gangopadhyay, Utpal ^b   Saha, Hiranmay ^b  

^a INDIAN INSTITUTE OF ENGINEERING SCIENCE AND TECHNOLOGY   (India)

^b JADAVPUR UNIVERSITY   (India)

^c Durgapur Women's College   (India)

Author keywords

A. Electronic materials; A. Metals; B. Chemical synthesis; D. Electrical properties

Indexed keywords

COATINGS; DEPOSITION; DEPOSITS; ELECTROCHEMISTRY; NICKEL; PH EFFECTS; SILICON; SOLAR CELLS; SUBSTRATES; SYNTHESIS (CHEMICAL);

CRYSTALLINE SOLAR CELLS; ELECTRICAL PROPERTIES; ELECTRONIC MATERIALS; SHEET RESISTANCE;

HYDRIDES;

EID: 12444256432     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2004.08.002     Document Type: Article

References (27)

1. H. Wieland, and A. Winkler Ann. Chem. 34 1923 198
2. W. Franke, and J. Moench Ann. Chem. 550 1942 1
3. A. Brenner, and G. Riddell J. Res. Nat. Bur. Standards 39 1947 385
4. G. Gutzeit, and R.W. Landon Plating 41 1954 14
5. A. Brenner Metal Finishing 52 1954 68
6. A.W. Goldenstein, W. Rostoker, F. Schossberger, and G. Gutzeit J. Electrochem. Soc. 104 1957 104
7. J.P. Randin, P.A. Maire, E. Saurer, and H.E. Hintermann J. Electrochem. Soc. 114 1967 442
8. G.O. Mallory Plating 61 1974 1005
9. M.S. Grewal, S.A. Sastri, and B.H. Alexander Thermochim. Acta 14 1976 25
10. S.H. Park, and D.N. Lee J. Mater. Sci. 23 1988 1643
11. M.V. Sullivan, and J.H. Eigler J. Electrochem. Soc. 104 1957 226
12. H. Iwasa, M. Yokozawa, and I. Teramoto J. Electrochem. Soc. 115 1968 485
13. C.M. Chong, S.R. Wenham, and M.A. Green Appl. Phys. Lett. 52 1988 407
14. Y. Hu, and S.P. Tay J. Vac. Sci. Technol. A 16 1998 1820
15. E.H. Lee, D.S. Kim, and S.H. Lee Solar Energy Mater. Sol. Cells 74 2002 65
16. F.A. Lowenheim Thin Film Processes 1978 Academic Press Inc.
17. N. Feldstein RCA Rev. 31 1970 317
18. W.T. Evans, and M. Schlesinger J. Electrochem. Soc. 141 1994 78
19. S. Dhar, and S. Chakrabarti Semicond. Sci. Technol. 11 1996 1231
20. T. Saito, E. Sato, M. Matsuoka, and C. Iwakura J. Appl. Electrochem. 28 1998 559
21. M. Tsujimura, H. Inoue, H. Ezawa, M. Miyata, and M. Ota Mater. Trans. 42 2002 1615
22. F. Delaunois, J.P. Petitjean, P. Lienard, and M. Jacob-Duliere Surf. Coat. Technol. 124 2000 201
23. Y. He, M. Qiao, J. Deng, and K. Fan Appl. Catal. A: General 228 2002 29
24. F. Delaunois, and P. Lienard Surf. Coat. Technol. 160 2002 239
25. J.T. Liu Appl. Phys. Lett. 34 1970 688
26. B.K. Singh, A. Chatterjee, A.N. Daw, and R.N. Mitra J. Electrochem. Soc. 136 1989 785
27. W. Schockley, Report No. AL-TOR-64-207, Air Force Atomic Laboratory, Wright-Patterson Air Force Base, Ohio, September 1964.