Chemical and thermal stability of alkanethiol and sulfur passivated InP(100)

Langmuir

Volumn 20, Issue 3, 2004, Pages 743-747

  Lim, Hyuneui ^a   Carraro, Carlo ^a   Maboudian, Roya ^a   Pruessner, Marcel W ^b   Ghodssi, Reza ^b  

^a University of California   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; COATINGS; CONTACT ANGLE; HIGH TEMPERATURE EFFECTS; HYDROCARBONS; SELF ASSEMBLY; SEMICONDUCTING INDIUM PHOSPHIDE; SULFUR; SURFACE TREATMENT; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

ALKANETHIOL; OXTADECANETHIOL;

SURFACE CHEMISTRY;

EID: 1242265484     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la035404u     Document Type: Article

References (28)

1. Adachi, S. Physical properties of III-V semiconductor compounds; Wiley: New York, 1992; Chapter 1.
2. Pruessner, M. W.; King, T. T.; Kelly, D. P.; Grover, R.; Calhoun, L. C.; Ghodssi, R. Sens. Actuators, A 2003, 105, 190.
3. Ulman, A. Chem. Rev. 1996, 96, 1533.
4. Buriak, J. M. Chem. Rev. 2002, 102, 1271.
5. Sheen, C. W.; Shi, J.-X.; Mártensson, J.; Parikh, A. N.; Allara, D. L. J. Am. Chem. Soc. 1992, 114, 1514.
6. Hung, W.-H.; Chen, H.-C.; Chang, C.-C.; Hsieh, J.-T.; Hwang, H.-L. J. Phys. Chem. B 1999, 103, 3663.
7. Shimomura, M.; Sanada, N.; Ichikawa, S.; Fukuda, Y.; Nagoshi, M.; Møller, P. J. J. Appl. Phys. 1998, 83, 3071.
8. Vaccaro, K.; Dauplaise, H. M.; Davis, A.; Spaziani, S. M.; Lorenzo, J. P. Appl. Phys. Lett. 1995, 67, 527.
9. Anderson, G. W.; Hanf, N. C.; Norton, P. R.; Lu, Z. H.; Graham, M. J. Appl. Phys. Lett. 1994, 65, 171.
10. Gallet, D.; Hollinger, G. Appl. Phys. Lett. 1993, 62, 982.
11. Paul, T. K.; Bose, D. N. J. Appl. Phys. 1991, 70, 7387.
12. Wilmsen, C. W.; Geib, K. M.; Shin, J.; Iyer, R.; Lile, D. L.; Pouch, J. J. J. Vac. Sci. Technol., B 1989, 7, 851.
13. Yamamoto, H.; Butera, R. A.; Gu, Y.; Waldeck, D. H. Langmuir 1999, 15, 8640.
14. Zerulla, D.; Chassé, T. Langmuir 2002, 18, 5392.
15. Gu, Y.; Butera, R. A.; Sementkowski, V. S.; Waldeck, D. H. Langmuir 1995, 11, 1849.
16. Owens, D. K.; Wendt, R. C. J. Appl. Polym. Sci. 1969, 13, 1741.
17. Mähl, S.; Neumann, M.; Schlett, V.; Baalmann, A. Surf. Interface Anal. 1998, 26, 204.
18. Hoekje, S. J.; Hoflund, G. B. Thin Solid Films 1991, 197, 367.
19. Hollinger, G.; Bergignat, E.; Joseph, J.; Robach, Y. J. Vac. Sci. Technol., A 1985, 3, 2082.
20. Ishida, T.; Hara, M.; Kojima, I.; Tsuneda, S.; Nishida, N.; Sasabe, H.; Knoll, W. Langmuir 1998, 14, 2092.
21. Wirde, M.; Gelius, U.; Dunbar, T.; Allara, D. Nucl. Instrum. Methods Phys. Res., Sect. B 1997, 131, 245.
22. Zerulla, D.; Chassé, T. Langmuir 1999, 15, 5285.
23. Kluth, G. J.; Carraro, C.; Maboudian, R. Phys. Rev. B 1999, 59, 449.
24. Han, S. M.; Ashurst, W. R.; Carraro, C.; Maboudian, R. J. Am. Chem. Soc. 2001, 123, 2422.
25. Ulman, A. An introduction to ultrathin organic films; Academic Press: Boston, MA, 1991.
26. Garbassi, F.; Morra, M.; Occhiello, E. Polymer surfaces from physics to technology; Wiley: New York, 1993.
27. Chassé, T.; Chassé, A.; Peisert, H.; Streubel, P. Appl. Phys. A 1997, 65, 543.
28. Sung, M. M.; Song, K.; Kim, C. G.; Lee, S. S.; Kim, Y. J. Phys. Chem. B 2000, 104, 2273.