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Volumn 40, Issue 2, 2005, Pages 333-340
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On the structure, stress and optical properties of CVD tungsten oxide films
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Author keywords
A. Optical materials; A. Thin films; B. Vapor deposition; C. Infrared spectroscopy; C. X ray diffraction; D. Mechanical properties; D. Microstructure; D. Optical properties
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
ELECTROCHROMISM;
INFRARED SPECTROSCOPY;
MECHANICAL PROPERTIES;
MICROSTRUCTURE;
OPTICAL MATERIALS;
OPTICAL PROPERTIES;
REACTION KINETICS;
THIN FILMS;
VAPOR DEPOSITION;
X RAY DIFFRACTION ANALYSIS;
FILM DENSITY;
FILM STRUCTURE;
PRECURSORS;
TUNGSTEN OXIDE FILMS;
TUNGSTEN COMPOUNDS;
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EID: 12344330606
PISSN: 00255408
EISSN: None
Source Type: Journal
DOI: 10.1016/j.materresbull.2004.10.017 Document Type: Article |
Times cited : (40)
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References (24)
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