Nanoprocessing of silicon by mechanochemical reaction using atomic force microscopy and additional potassium hydroxide solution etching

Nanotechnology

Volumn 16, Issue 1, 2005, Pages 149-157

  Miyake, Shojiro ^a   Kim, Jongduk ^a  

^a NIPPON INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; ETCHING; FABRICATION; NANOSTRUCTURED MATERIALS; PIEZOELECTRIC DEVICES; POTASSIUM COMPOUNDS;

ETCHING RATE; MECHANOCHEMICAL PROCESSING; SCANNING DENSITY; SCANNING PROBE MICROSCOPY (SPM);

SILICON;

EID: 12344288211     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/1/029     Document Type: Article

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