Application of novel O- and H-atom sources in molecular beam epitaxy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1446-1450

  Hoflund, Gar B ^a   Wolan, John T ^a  

^a University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744333957     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590296     Document Type: Article

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