Low-frequency modulation of pulsed d.c. or r.f. discharges for controlling the reactive magnetron sputtering process

Surface and Coatings Technology

Volumn 86-87, Issue PART 2, 1996, Pages 722-727

  Billard, A ^a   Frantz, C ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

Insulating compounds; Process stabilizing method; Pulsed discharges; Reactive magnetron sputtering

Indexed keywords

ALUMINA; ELECTRIC DISCHARGES; FEEDBACK CONTROL; FILMS; MAGNETRON SPUTTERING; MODULATION; PROCESSING;

INSULATING COMPOUNDS; PROCESS-STABILIZING METHOD; PULSED DISCHARGES; REACTIVE MAGNETRON SPUTTERING;

SPUTTER DEPOSITION;

EID: 0030387390     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)03064-2     Document Type: Article

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