Novel deformable mirror based on MEMS technology

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 25, Issue 9, 2004, Pages 1154-1158

  Yu, Hongbin ^a   Chen, Haiqing ^a   Zhu, Zimin ^a   Zhang, Dacheng ^b   Li, Ting ^b  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b PEKING UNIVERSITY   (China)

Author keywords

Bulk micromachining; Deformable mirror; Electrostatic actuating; Resonant frequency

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRON MOBILITY; NUMERICAL ANALYSIS; SCHOTTKY BARRIER DIODES; SEMICONDUCTING SILICON COMPOUNDS;

BULK MICROMACHINING; DEFORMABLE MIRROR; ELECTROSTATIC ACTUATING; MEMS TECHNOLOGY; RESONANT FREQUENCY; SILICON MICROMACHINING TECHNOLOGY;

MOSFET DEVICES;

EID: 11444257433     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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