Photosensitive polynorbornene based dielectric. II. Sensitivity and spatial resolution

Journal of Applied Polymer Science

Volumn 91, Issue 5, 2004, Pages 3031-3039

  Bai, Yiqun ^a   Chiniwalla, Punit ^a   Elce, Edmund ^b   Allen, Sue Ann Bidstrup ^a   Kohl, Paul A ^a  

^a Georgia Institute of Technology   (United States)

^b Promerus LLC   (United States)

Author keywords

Crosslinking; Dielectric properties; Photopolymerization

Indexed keywords

COMPOSITION EFFECTS; CROSSLINKING; DIELECTRIC MATERIALS; DIFFUSION; EVAPORATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTOPOLYMERIZATION; PHOTOSENSITIVITY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TRANSPORT PROPERTIES; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOACTIVE COMPOUNDS; PHOTODEFINITION PROPERTIES; POLYEPOXIDENORBORNENE; POLYNORBORNENE;

COPOLYMERS;

CROSS LINKING; DIELECTRIC PROPERTY; POLYMERIZATION;

EID: 1142305286     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/app.13530     Document Type: Article

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