A new technique to fabricate ultra-shallow-junctions, combining in situ vapour HCl etching and in situ doped epitaxial SiGe re-growth

Applied Surface Science

Volumn 224, Issue 1-4, 2004, Pages 63-67

  Loo, Roger ^a   Caymax, Matty ^a   Meunier Beillard, Philippe ^b   Peytier, Ivan ^a   Holsteyns, Frank ^a   Kubicek, Stefan ^a   Verheyen, Peter ^a   Lindsay, Richard ^a   Richard, Olivier ^a  

^a IMEC   (Belgium)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Chemical vapour etch; CVD; SEG; Si etch back; SiGe; Ultra shallow junctions

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONTAMINATION; CRYSTAL DEFECTS; DOPING (ADDITIVES); EPITAXIAL GROWTH; ETCHING; HYDROCHLORIC ACID;

CHEMICAL VAPOR ETCHING (CVE); DOPANTS; DRAIN JUNCTIONS; SELECTIVE EPITAXIAL GROWTH (SEG); SI ETCH BACK; SIGE; ULTRA-SHALLOW-JUNCTIONS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 1142280323     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.08.030     Document Type: Conference Paper

References (9)

1. M.C. Öztürk, N. Pesovic, J. Liu, H. Mo, I. Kang, S. Gannavaram, in: Electrochemical Society Proceedings Volume 2002-2, p. 761.
2. Raaijmakers I.J., Sprey H., Storm A., Bergman T., Italiano J., Meyer D. J. Vac. Sci. Technol. B. 17:1999;2311.
3. S. Gannavaram, N. Pesovic, M. C. Öztürk, in: Proceedings of the IEDM 2000, p. 437.
4. R. Loo, M. Caymax, O. Richard, P. Verheyen, N. Collaert, in: Proceedings of UCPSS 2002, Solid State Phenomena 92 (2003) pp. 199-202.
5. M. Meuris, et al., in: Proceedings of the 1999 IEEE International Symposium on Semiconductor Manufacturing, p. 157.
6. R. Loo, M. Caymax, to be presented at ISTDM 2003 accepted for publication in Applied Surface Science (in print).
7. F. Holsteyns, et al. Optimization and monitoring of cleaning processes for 100 nm and smaller design rules, in: KLA-Tencor Yield Management Seminar, Singapore, 2001.
8. H. van Meer, S. Kubicek, J. Lyu, M. Caymax, R. Loo, K. De Meyer, in: Proceedings of the ESSDERC'99, p. 388.
9. M. Jurczak, M. de Potter, R. Rooyackers. W. Jeamsaksiri, A. Redolfi, L. Grau, A. Lauwers, R. Lindsay, I. Peytier, E. Augendre, G. Badenes, in: Proceedings of the ESSDERC'02, p. 311.