Metrology issues in thin ONO stacks measurements by spectroscopic ellipsometry and X-ray reflectivity

Thin Solid Films

Volumn 450, Issue 1, 2004, Pages 120-123

  Bellandi, E ^a   Elbaz, A ^a   Spadoni, S ^a   Piagge, R ^a   Coccorese, C ^a   Pavia, G ^a   Ferrari, S ^b   Banerjee, S ^c   Alessandri, M ^a  

^a STMICROELECTRONICS   (Italy)

^b LABORATORIO MDM   (Italy)

^c SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

Author keywords

Ellipsometry; Flash memory; ONO; XRR

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; DATA ACQUISITION; DEPOSITION; ELLIPSOMETRY; FLASH MEMORY; INTERFACES (MATERIALS); LIGHT REFLECTION; MOLECULAR STRUCTURE; MONOCHROMATORS; NITROGEN OXIDES; SPECTROSCOPIC ANALYSIS; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY ANALYSIS;

SPECTROSCOPIC ELLIPSOMETRY (SE); X-RAY REFLECTIVITY (XRR);

THIN FILMS;

EID: 1142279627     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.10.050     Document Type: Conference Paper

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