Radiation resistance of single and multilayer coatings against synchrotron radiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5250, Issue , 2004, Pages 146-157

  Gunster St ^a   Blaschke, H ^a   Ristau, D ^a   Danailov, M ^b   Trovo M ^b   Gatto, A ^c   Kaiser, N ^c   Sarto, F ^d   Flori, D ^d   Menchini, F ^d  

^a LASER ZENTRUM HANNOVER E V   (Germany)

^b SINCROTRONE TRIESTE   (Italy)

^c FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^d ENEA   (Italy)

Author keywords

Optics characterization; Radiation resistance; Synchrotron radiation; VUV coatings

Indexed keywords

OPTICS CHARACTERIZATION; RADIATION RESISTANCE; VUV COATINGS;

ALUMINUM; DEGRADATION; DEPOSITION; ELECTROMAGNETIC WAVE ABSORPTION; EVAPORATION; FREE ELECTRON LASERS; INTERFEROMETRY; MIRRORS; MULTILAYERS; SPUTTER DEPOSITION; SYNCHROTRON RADIATION; X RAY DIFFRACTION ANALYSIS;

OPTICAL COATINGS;

EID: 11144354719     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.514801     Document Type: Conference Paper

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