A promising evaluation method of ultra-low-expansion glasses for the extreme ultra-violet lithography system by the line-focus-beam ultrasonic material characterization system

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 11 A, 2004, Pages

  Kushibiki, Jun Ichi ^a   Arakawa, Mototaka ^a   Ohashi, Yuji ^a   Suzuki, Kouji ^a   Maruyama, Takahisa ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

CTE evaluation; EUVL system; Leaky surface acoustic waves; Line focus beam ultrasonic material characterization system; TiO 2 doped SiO2 glass; Ultra low expansion glasses; Velocity measurement

Indexed keywords

ACOUSTIC WAVES; ANISOTROPY; CHARACTERIZATION; CONCENTRATION (PROCESS); FUSED SILICA; GLASS; THERMAL EXPANSION; VELOCITY MEASUREMENT;

CTE EVALUATION; EUVL SYSTEMS; LEAKY SURFACE ACOUSTIC WAVES; LINE-FOCUS BEAM ULTRASONIC MATERIAL CHARACTERIZATION SYSTEMS; SPECTRAL DISTRIBUTION; ULTRA-LOW EXPANSION GLASSES; WAVE NUMBERS;

LITHOGRAPHY;

EID: 11144347587     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.L1455     Document Type: Article

References (7)

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