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Volumn 51, Issue 6 II, 2004, Pages 3312-3317

Spatial and temporal characteristics of energy deposition by protons and alpha particles in silicon

Author keywords

rays; Alphas; Energy deposition; Geant4; Ion track; Metal oxide semiconductor (MOS); Monte Carlo simulation; Protons; Radial dose; Radiation effects; Single event effects

Indexed keywords

ALPHA PARTICLES; COMPUTER SIMULATION; IONS; MONTE CARLO METHODS; MOS DEVICES; PROTONS; RADIATION EFFECTS;

EID: 11044238578     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNS.2004.839176     Document Type: Conference Paper
Times cited : (33)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.