Electrical characterization of anodically oxidized Ta2O 5 films

Electrochemistry

Volumn 72, Issue 11, 2004, Pages 737-742

  Shimizu, Hirofumi ^a   Sugeno, Fujio ^a   Nishimura, Shigeoki ^b   Endo, Hideharu ^b   Honda, Mitsutoshi ^b  

^a NIHON UNIVERSITY   (Japan)

^b HITACHI LTD   (Japan)

Author keywords

Anodic Oxidation Layer; Capacitance Voltage Curve; Ta; Work Function

Indexed keywords

BAND STRUCTURE; CAPACITANCE; CMOS INTEGRATED CIRCUITS; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRONIC STRUCTURE; ELLIPSOMETRY; SCANNING ELECTRON MICROSCOPY; SCHOTTKY BARRIER DIODES; SOLUTIONS; SPECTROSCOPIC ANALYSIS; TANTALUM COMPOUNDS;

ANODIC OXIDATION LAYERS; CAPACITANCE-VOLTAGE CURVE; FREQUENCY OSCILLATION; WORK FUNCTION;

THIN FILMS;

EID: 10944236816     PISSN: 13443542     EISSN: None     Source Type: Journal    
DOI: 10.5796/electrochemistry.72.737     Document Type: Article

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