Photodegradation of poly(ether sulphone) Part 1. A time-of-flight secondary ion mass spectrometry study

Surface and Interface Analysis

Volumn 36, Issue 12, 2004, Pages 1533-1541

  Norrman, K ^a   Kingshott, P ^a   Kaeselev, B ^b   Ghanbari Siahkali, A ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b ALFA LAVAL   (Denmark)

Author keywords

ATR IR; Chain scission; Cross linking; Membrane; Photodegradation; Photooxidation; Poly(ether sulphone); ToF SIMS; XPS

Indexed keywords

BENZENE; CROSSLINKING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS CHROMATOGRAPHY; HIGH PRESSURE LIQUID CHROMATOGRAPHY; PHOTOOXIDATION; SECONDARY ION MASS SPECTROMETRY; THERMOGRAVIMETRIC ANALYSIS; ULTRAFILTRATION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHAIN SCISSION; PHOTOIRRADIATION; POLY(ETHER SULPHONE); TIME-OF-FLIGHT SECONDARY ION MASS SPECTROMETRY (TOF-SIMS);

PHOTODEGRADATION;

EID: 10844285659     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1980     Document Type: Article

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