Radiation-induced degradation of polyethersulphone films studied by fluorescent X-ray emission spectroscopy

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 155, Issue 4, 1999, Pages 431-439

  Kurmaev, E Z ^a   Winarski, R P ^b   Endo, K ^c   Ida, T ^c   Moewes, A ^d   Ederer, D L ^b   Pivin, J C ^e   Shamin, S N ^a   Trofimova, V A ^a   Yarmoshenko, Yu M ^a  

^a INSTITUTE OF METAL PHYSICS   (Russian Federation)

^b Tulane University   (United States)

^c KANAZAWA UNIVERSITY   (Japan)

^d LOUISIANA STATE UNIVERSITY   (United States)

^e 91405 Orsay Campus   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ATOMS; CHEMICAL BONDS; DEGRADATION; ELECTRON ENERGY LEVELS; ELECTRONIC STRUCTURE; FLUORESCENCE; ION BOMBARDMENT; PROBABILITY DENSITY FUNCTION; X RAY SPECTROSCOPY;

DEMON DENSITY FUNCTIONAL THEORY; FLUORESCENT X RAY EMISSION SPECTROSCOPY; POLYETHERSULPHONE FILMS; PRIMARY ION SOLID INTERACTIONS;

ORGANIC POLYMERS;

EID: 0033311940     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00463-2     Document Type: Article

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