Interfacial stability of electrodeposition of cuprous oxide films

Journal of Chemical Physics

Volumn 121, Issue 19, 2004, Pages 9630-9638

  Neogi, P ^a  

^a Architectural and Environmental Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODE REACTIONS; INTERFACIAL STABILITY; LINEAR STABILITY ANALYSIS;

ELECTROCHEMISTRY; ELECTRODEPOSITION; INTERFACES (MATERIALS); OSCILLATIONS; PH EFFECTS; POSITIVE IONS; TEXTURES;

COPPER OXIDES;

EID: 10844249158     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1803541     Document Type: Article

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