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Electrochimica Acta

Volumn 47, Issue 8, 2002, Pages 1267-1273

Onset of current-driven concentration instabilities in thin cell electrodeposition with small inter-electrode distance

(4) Rosso, M a Chassaing, E b Chazalviel, J N a Gobron, T c

a LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE (France)

b CNRS (France)

c UNIVERSITÉ DE CERGY PONTOISE (France)

Author keywords

Concentration instabilities; Copper sulfate; Growth; Impedance; Thin cell electrodeposition

Indexed keywords

ANODES; CATHODES; COPPER; CURRENT DENSITY; ELECTRIC IMPEDANCE; ELECTROCHEMICAL ELECTRODES; SOLUTIONS;

INTER-ELECTRODE DISTANCES;

ELECTRODEPOSITION;

EID: 0036472225 PISSN: 00134686 EISSN: None Source Type: Journal
DOI: 10.1016/S0013-4686(01)00848-9 Document Type: Article

Times cited : (39)

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