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Materials Transactions

Volumn 45, Issue 10, 2004, Pages 3023-3027

Electrical and optical properties of IrO2 thin films prepared by laser-ablation

(3) Liu, Yuxue a Masumoto, Hiroshi a Goto, Takashi a

a TOHOKU UNIVERSITY (Japan)

Author keywords

AFM; Glancing angle incidence X ray diffraction; IrO2 film; Resistivity; Transmittance; X ray photaelectron spectra

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY; LASER ABLATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SPUTTERING; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

GLANCING ANGLE INCIDENCE X-RAY DIFFRACTION; IRO2 FILM; RESISTIVITY; TRANSMITTANCE; X-RAY PHOTOELECTRON SPECTRA;

IRIDIUM COMPOUNDS;

EID: 10444272561 PISSN: 13459678 EISSN: None Source Type: Journal
DOI: 10.2320/matertrans.45.3023 Document Type: Article

Times cited : (31)

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