Characterization of sputtered iridium dioxide thin films

Journal of Materials Research

Volumn 13, Issue 5, 1998, Pages 1318-1326

  Liao, P C ^a   Ho, W S ^a   Huang, Y S ^a   Tiong, K K ^b  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000792296     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1998.0187     Document Type: Article

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