Real structure and magnetic properties of UN thin films

Journal of Alloys and Compounds

Volumn 386, Issue 1-2, 2005, Pages 87-95

  Rafaja, D ^a,b   Havela, L ^b   Kuzel R ^b   Wastin, F ^c   Colineau, E ^c   Gouder, T ^c  

^a TU BERGAKADEMIE FREIBERG   (Germany)

^b CHARLES UNIVERSITY   (Czech Republic)

^c JOINT RESEARCH CENTRE   (Italy)

Author keywords

Magnetic films and multilayers; Magnetic measurements; Nanostructures; X ray diffraction

Indexed keywords

ANTIFERROMAGNETISM; DEPOSITION; MAGNETIC FILMS; MAGNETIC MOMENTS; MAGNETIC PROPERTIES; MAGNETIC VARIABLES MEASUREMENT; MAGNETIZATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PARAMAGNETISM; RESIDUAL STRESSES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS PHASE; CRITICAL TEMPERATURES; CRYSTALLINE PHASES; ORBITAL MOMENTS;

URANIUM COMPOUNDS;

EID: 10444236610     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2004.06.020     Document Type: Article

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