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Volumn 25, Issue 4, 2005, Pages 592-596
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Development of cross-hatch grid morphology and its effect on ordering growth of quantum dots
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Author keywords
A1. Nanostructures; A1. Stress; A1. Surface structure; A3. Molecular beam epitaxy; B2. Semiconducting III V materials
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Indexed keywords
DISLOCATIONS (CRYSTALS);
INTERFACES (MATERIALS);
MOLECULAR BEAM EPITAXY;
MORPHOLOGY;
NANOSTRUCTURED MATERIALS;
PARALLEL PROCESSING SYSTEMS;
SEMICONDUCTING INDIUM GALLIUM ARSENIDE;
SEMICONDUCTOR GROWTH;
SURFACE STRUCTURE;
ULTRATHIN FILMS;
PARALLEL COMPUTING ARCHITECTURES;
SEMICONDUCTING III-V MATERIALS;
SINGLE-ELECTRON TRANSISTORS;
SEMICONDUCTOR QUANTUM DOTS;
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EID: 10144260672
PISSN: 13869477
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physe.2004.09.008 Document Type: Article |
Times cited : (10)
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References (13)
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