Fabrication and characterization of reactively sputtered TaN thin-film resistors for millimeter wave applications

Electrochemical and Solid-State Letters

Volumn 7, Issue 11, 2004, Pages

  Mellberg, A ^a   Nicols, S P ^a   Rorsman, N ^a   Zirath, H ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; CAPACITORS; CHARACTERIZATION; FABRICATION; MILLIMETER WAVES; MONOLITHIC MICROWAVE INTEGRATED CIRCUITS; OXIDATION; SILICON NITRIDE; SPUTTERING; TANTALUM COMPOUNDS; THIN FILM DEVICES;

ROOM TEMPERATURE; SEMICONDUCTOR PARAMETER ANALYZERS; THIN-FILM RESISTORS (TFR);

RESISTORS;

EID: 10044277997     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1804985     Document Type: Article

References (8)

1. A. Katz, S. J. Pearton, S. Nakahara, F. A. Baiocchi, E. Lane, and J. Kovalchick, J. Appl. Phys., 73, 5208 (1993).
2. R. F. Kopf, R. Melendes, D. C. Jacobson, A. Tate, M. A. Melendes, R. R. Reyes, R. A. Hamm, Y. Yang, J. Franckoviak, N. G. Weimann, H. L. Maynard, and C. T. Liu, J. Vac. Sci. Technol., 20, 871 (2002).
3. P. Rachnev, P. H. Philippov, and D. Parashkevov, Thin Solid Films, 143, 91 (1986).
4. B. Mehrotra and J. Stimmel, J. Vac. Sci. Technol. B, 5, 1736 (1987).
5. H. Zirath, J. Grahn, N. Rorsman, A. Mellberg, J. Stake, I. Angelov, and P. Starski, Conf. Proc. GaAs 2003, p. 469 (2003).
6. M. Hafizi, W. E. Stanchina, J. F. Williams, and J. F. Jensen, IEEE Trans. Microwave Theory Tech., 43, 3048 (1995).
7. W. H. Lee, J. C. Lin, and C. Lee, Mater. Chem. Phys., 68, 266 (2001).
8. S. J. Pearton, F. Ren, C. R. Abemathy, W. S. Hobson, T. R. Fullowan, and R. Esagui, J. Appl. Phys., 61, 586 (1992).