Thin-film resistor fabrication for InP technology applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 3, 2002, Pages 871-875

  Kopf, R F ^a   Melendes, R ^a   Jacobson, D C ^a   Tate, A ^a   Melendes, M A ^a   Reyes, R R ^a   Hamm, R A ^a   Yang, Y ^a   Frackoviak, J ^a   Weimann, N G ^a   Maynard, H L ^a   Liu, C T ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; ELECTROMIGRATION; NICKEL ALLOYS; OXIDATION; PLASMAS; RESISTORS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING INDIUM PHOSPHIDE; SPUTTER DEPOSITION; STOICHIOMETRY; TANTALUM COMPOUNDS; THERMODYNAMIC STABILITY;

THIN FILM RESISTORS;

THIN FILM DEVICES;

EID: 0035998533     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1473179     Document Type: Conference Paper

References (13)